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Article dans une revue

Mesoporous materials from SiO 2 and NiTiO 3

Abstract : In this work, we synthesized and characterized mesoporous thin films of SiO2 and NiTiO3 structured by a surfactant called Brij58. These films were fabricated by the method of dip coating and the best conditions for well-structured thin films were investigated as a function of surfactant concentration and different types of substrates. These films have been characterized by X-ray reflectivity which was calculated using the matrix formalism. We demonstrated that the silicon substrate had a great effect on the structure and porosity of the fabricated films for both SiO2 and NiTiO3. Furthermore, we found that mesoporosity has been increased as a function of the surfactant concentration in the solution. This experimental procedure allows also to produce NiTiO3 powders which have been characterized by X-ray diffraction. The XRD coupled to the crystallographic software “Maud”shows that the samples are constituted by 98, 2% NiTiO3 powders.
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https://hal-univ-lemans.archives-ouvertes.fr/hal-01906030
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Soumis le : vendredi 26 octobre 2018 - 12:47:10
Dernière modification le : mardi 27 septembre 2022 - 04:39:34

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E. Achhal, H. Jabraoui, S. Ouaskit, Alain Gibaud. Mesoporous materials from SiO 2 and NiTiO 3. Molecular Crystals and Liquid Crystals, Taylor & Francis, 2016, 634 (1), pp.121 - 129. ⟨10.1080/15421406.2015.1137271⟩. ⟨hal-01906030⟩

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